Tosoh Quartz Corporation

LCD/OEL Photomask Substrate

As-Cut Substrate/Polished Substrate

Our company uses exclusive photomask-use grade synthetic silica glass (ES grade) manufactured by Tosoh SGM. This material has excellent UV transmittance, laser-resistance and purity, and is used as a raw material for photomask substrates. In order to meet the demand for larger size photomasks, we mass-produce one of the largest synthetic silica glass ingots in the world, and are able to supply larger-than 10th generation-sized products for As-Cut substrates.

◎Standard Size for As-Cut Substrate
Narrow Side (mm) Long Side (mm) Thickness (mm)
520 800 11
700 800 9
800 920 9
800 920 11
800 960 9
850 1,200 11
850 1,400 11
1,220 1,400 14
1,620 1,780 17

Other sizes are also available. Please ask.